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KMID : 0381920150450030119
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Korean Journal of Microscopy
2015 Volume.45 No. 3 p.119 ~ p.125
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Vapor Deposition Techniques for Synthesis of Two-Dimensional Transition Metal Dichalcogenides
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Song Jeong-Gyu
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Abstract
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Two-dimensional (2D) transition metal dichalcogenides (TMDCs) have attracted significant attention due to their unique and exotic properties attributed to their low dimensionality. In particular, semiconducting 2D TMDCs such as MoS2, WS2, MoSe2, and WSe2 have been demonstrated to be feasible for various advanced electronic and optical applications. In these regards, process to synthesize high quality 2D TMDCs layers with high reliability, wafer-scale uniformity, controllable layer number and excellent electronic properties is essential in order to use 2D TMDCs in practical applications. Vapor deposition techniques, such as physical vapor deposition, chemical vapor deposition and atomic layer deposition, could be promising processes to produce high quality 2D TMDCs due to high purity, thickness controllability and thickness uniformity. In this article, we briefly review recent research trend on vapor deposition techniques to synthesize 2D TMDCs.
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KEYWORD
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Molybdenum disulfide, Transition metal dichalcogenides, Two-dimensional materials, Chemical vapor deposition, Atomic layer deposition
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